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BS IS0 16531:2020 BSl Standards Publication Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS bsi. BS ISO 16531:2020 BRITISH STANDARD National foreword This British Standard is the UK implementation of IS0 16531:2020. It supersedesBSIS016531:2013,whichiswithdrawn. The UK participation in its preparation was entrusted to Technical Committee Cll/60, Surface chemical analysis. A list of organizations represented on this committee can be obtained on requestto its committeemanager. This publication does not purport to include all the necessary provisions of a contract.Users areresponsiblefor its correct application. @The British Standards Institution 2020 Published byBSI Standards Limited 2020 ISBN9780539057850 ICS 71.040.40 Compliance with a British Standard cannot confer immunity from legal obligations. This British Standard was published under the authority of the StandardsPolicyandStrategyCommitteeon31October2020. Amendments/corrigendaissuedsincepublication Date Textaffected BS IS0 16531:2020 ISO INTERNATIONAL STANDARD 16531 Second edition 2020-10 Surface chemical analvsis Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS Analyse chimique des surfaces-Profilaged'épaisseur-Methodes d'alignement du faisceau d'ions et la mesure associee de densite de courant ou de courant pour le profilage d'épaisseur en AES et XPS Reference number IS0 16531:2020(E) ISO @ISO 2020

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ISO 16531 2020 Surface chemical analysis  Depth profiling  Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS 第 1 页 ISO 16531 2020 Surface chemical analysis  Depth profiling  Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS 第 2 页 ISO 16531 2020 Surface chemical analysis  Depth profiling  Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS 第 3 页
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